參數(shù)資料
型號(hào): LTC4099EPDC#TRPBF
廠商: LINEAR TECHNOLOGY CORP
元件分類(lèi): 電源管理
英文描述: 1-CHANNEL POWER SUPPLY MANAGEMENT CKT, PQCC20
封裝: 3 X 4 MM, 0.55 MM HEIGHT, LEAD FREE, PLASTIC, UTQFN-20
文件頁(yè)數(shù): 22/36頁(yè)
文件大?。?/td> 536K
代理商: LTC4099EPDC#TRPBF
LTC4099
4099fd
+
+
RNOM
10k
RNTC
10k
NTC
0.228 NTCBIAS
OVERTEMP
4099 F07
LTC4099
NTC BLOCK
TOO_COLD
TOO_HOT
0.738 NTCBIAS
0.326 NTCBIAS
+
2
NTCBIAS
3
T
+
+
RNOM
10.2k
RNTC
10k
R1
845
NTC
0.228 NTCBIAS
OVERTEMP
4099 F08
TOO_COLD
TOO_HOT
0.738 NTCBIAS
0.326 NTCBIAS
+
2
LTC4099
NTC BLOCK
T
NTCBIAS
3
Figure 7. Standard NTC Configuration
Byusingabiasresistor,RNOM,differentinvaluefrom
R25,thehotandcoldtrippointscanbemovedineither
direction.Thetemperaturespanwillchangesomewhatdue
tothenonlinearbehaviorofthethermistor.Thefollowing
equationscanbeusedtoeasilycalculateanewvaluefor
thebiasresistor:
RNOM =
aHOT
0.4839
R25
RNOM =
aCOLD
2.816
R25
where
aHOTandaCOLDaretheresistanceratiosatthe
desiredhotandcoldtrippoints.Notethattheseequations
arelinked.Therefore,onlyoneofthetwotrippointscan
bechosen;theotherisdeterminedbythedefaultratios
designedintheLTC4099.Consideranexamplewherea
50°Chottrippointisdesired.
From the Vishay curve 2 R-T characteristics,
aHOT is
0.4086at50°C.Usingthepriorequation,RNOMshould
besetto8.45k.WiththisvalueofRNOM,aCOLDis2.380
andthecoldtrippointisabout4°C.Noticethatthespan
isnow46°Cratherthantheprevious45°C.Thisisdueto
thedecreaseinthetemperaturegainofthethermistoras
theabsolutetemperatureincreases.
Theupperandlowertemperaturetrippointscanbein-
dependently programmed by using an additional bias
resistorasshowninFigure8.Thefollowingformulascan
beusedtocomputethevaluesofRNOMandR1:
RNOM =
aCOLD – aHOT
2.332
R25
R1
= 0.4839 RNOM – aHOT R25
Forexample,tosetthetrippointsto0°Cand50°Cwith
aVishaycurve2thermistor,choose:
RNOM =
2.816 – 0.4086
2.332
10k
= 10.32k
thenearest1%valueis10.2k:
R1=0.483910.2k–0.408610k=0.850k
Thenearest1%valueis845Ω.Thefinalcircuitisshown
inFigure8,andresultsinanuppertrippointof50°Cand
alowertrippointof0°C.
Figure 8. Modified NTC Configuration
applicaTions inForMaTion
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