參數(shù)資料
型號: ATF-13100
英文描述: 2-18 GHz Low Noise Gallium Arsenide FET(2-18 GHz 低噪聲砷化鎵 FET)
中文描述: 2-18 GHz的低噪聲砷化鎵場效應管(2-18 GHz的低噪聲砷化鎵場效應管)
文件頁數(shù): 1/3頁
文件大?。?/td> 43K
代理商: ATF-13100
5-33
2–18 GHz Low Noise
Gallium Arsenide FET
Technical Data
Features
Low Noise Figure:
1.1 dB Typical at 12 GHz
High Associated Gain:
9.5 dB Typical at 12 GHz
High Output Power:
17.5 dBm Typical P
1 dB
at 12 GHz
ATF-13100
Chip Outline
Electrical Specifications, T
A
= 25
°
C
Symbol
NF
O
Parameters and Test Conditions
[1]
Optimum Noise Figure: V
DS
= 2.5 V, I
DS
= 20 mA
Units Min.
dB
dB
dB
dB
dB
dB
Typ. Max.
0.8
1.1
1.5
12.0
9.5
8.0
17.5
f = 8.0 GHz
f = 12.0 GHz
f = 15.0 GHz
f = 8.0 GHz
f = 12.0 GHz
f = 15.0 GHz
f = 12.0 GHz dBm
1.2
G
A
Gain @ NF
O
; V
DS
= 2.5 V, I
DS
= 20 mA
9.0
P
1 dB
Power Output @ 1 dB Gain Compression
V
DS
= 4 V, I
DS
= 40 mA
1 dB Compressed Gain; V
DS
= 4 V, I
DS
= 40 mA
Transconductance: V
DS
= 2.5 V, V
GS
= 0 V
Saturated Drain Current; V
DS
= 2.5 V, V
GS
= 0 V
Pinchoff Voltage: V
DS
= 2.5 V, I
DS
= 1 mA
G
1 dB
g
m
I
DSS
V
P
f = 12.0 GHz
dB
8.5
55
50
-1.5
mmho
mA
V
30
40
-3.0
90
-0.8
Note:
1.
RF performance is determined by assembling and testing 10 samples per wafer
.
Description
The ATF-13100 is a high perfor-
mance gallium arsenide Schottky-
barrier-gate field effect transistor
chip. This device is designed for
use in low noise, wideband
amplifier and oscillator applica-
tions in the 2-18GHz frequency
range.
This GaAs FET device has a
nominal 0.3 micron gate length
with a total gate periphery of
250microns. Proven gold based
metallization systems and nitride
passivation assure a rugged,
reliable device.
The recommended mounting
procedure is to die attach at a
stage temperature of 300
°
C using
a gold-tin preform under forming
gas. Assembly can be preformed
with either wedge or ball bonding
using 0.7 mil gold wire. See also
“Chip Use” in the APPLICATIONS
section.
D
G
S
S
5965-8694E
相關PDF資料
PDF描述
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ATF-13336 2-16 GHz Low Noise Gallium Arsenide FET(2-16 GHz 低噪聲砷化鎵 FET)
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