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    • 您現(xiàn)在的位置:買(mǎi)賣(mài)IC網(wǎng) > PDF目錄98035 > MPSW10RLRM (ON SEMICONDUCTOR) 500 mA, 300 V, NPN, Si, SMALL SIGNAL TRANSISTOR, TO-92 PDF資料下載
    參數(shù)資料
    型號(hào): MPSW10RLRM
    廠商: ON SEMICONDUCTOR
    元件分類(lèi): 小信號(hào)晶體管
    英文描述: 500 mA, 300 V, NPN, Si, SMALL SIGNAL TRANSISTOR, TO-92
    封裝: PLASTIC, TO-226AE, 3 PIN
    文件頁(yè)數(shù): 24/34頁(yè)
    文件大小: 337K
    代理商: MPSW10RLRM
    第1頁(yè)第2頁(yè)第3頁(yè)第4頁(yè)第5頁(yè)第6頁(yè)第7頁(yè)第8頁(yè)第9頁(yè)第10頁(yè)第11頁(yè)第12頁(yè)第13頁(yè)第14頁(yè)第15頁(yè)第16頁(yè)第17頁(yè)第18頁(yè)第19頁(yè)第20頁(yè)第21頁(yè)第22頁(yè)第23頁(yè)當(dāng)前第24頁(yè)第25頁(yè)第26頁(yè)第27頁(yè)第28頁(yè)第29頁(yè)第30頁(yè)第31頁(yè)第32頁(yè)第33頁(yè)第34頁(yè)
    Reliability and Quality Assurance
    9–18
    Motorola Small–Signal Transistors, FETs and Diodes Device Data
    Figure 2. Impact of Assignable Causes
    on Process Predictable
    Figure 3. Difference Between Process
    Control and Process Capability
    ?
    Process “under control” – all assignable causes are
    removed and future distribution is predictable.
    PREDICTION
    TIME
    SIZE
    TIME
    PREDICTION
    SIZE
    TIME
    Out of control
    (assignable causes present)
    In control assignable
    causes eliminated
    SIZE
    TIME
    In control but not capable
    (variation from random variability
    excessive)
    Lower
    Specification Limit
    Upper
    Specification Limit
    In control and capable
    (variation from random
    variability reduced)
    ?
    At Motorola, for critical parameters, the process capability
    is acceptable with a Cpk = 1.50 with continual improvement
    our goal. The desired process capability is a Cpk = 2 and the
    ideal is a Cpk = 5. Cpk, by definition, shows where the current
    production process fits with relationship to the specification
    limits. Off center distributions or excessive process variability
    will result in less than optimum conditions.
    SPC IMPLEMENTATION AND USE
    CPSTG uses many parameters that show conformance to
    specification. Some parameters are sensitive to process
    variations while others remain constant for a given product
    line. Often, specific parameters are influenced when changes
    to other parameters occur. It is both impractical and
    unnecessary to monitor all parameters using SPC methods.
    Only critical parameters that are sensitive to process
    variability are chosen for SPC monitoring. The process steps
    affecting these critical parameters must be identified as well.
    It is equally important to find a measurement in these process
    steps that correlates with product performance. This
    measurement is called a critical process parameter.
    Once the critical process parameters are selected, a
    sample plan must be determined. The samples used for
    measurement are organized into RATIONAL SUBGROUPS
    of approximately two to five pieces. The subgroup size should
    be such that variation among the samples within the subgroup
    remain small. All samples must come from the same source
    e.g., the same mold press operator, etc. Subgroup data should
    be collected at appropriate time intervals to detect variations
    in the process. As the process begins to show improved
    stability, the interval may be increased. The data collected
    must be carefully documented and maintained for later
    correlation. Examples of common documentation entries are
    operator, machine, time, settings, product type, etc.
    Once the plan is established, data collection may begin. The
    data collected with generate X and R values that are plotted
    with respect to time. X refers to the mean of the values within
    a given subgroup, while R is the range or greatest value minus
    least value. When approximately 20 or more X and R values
    have been generated, the average of these values is
    computed as follows:
    X = (X + X2 + X3 + . . .)/K
    R = (R1 + R2 + R2 + . . .)/K
    where K = the number of subgroups measured.
    The values of X and R are used to create the process control
    chart. Control charts are the primary SPC tool used to signal
    a problem. Shown in Figure 4, process control charts show X
    and R values with respect to time and concerning reference
    to upper and lower control limit values. Control limits are
    computed as follows:
    R upper control limit = UCLR = D4 R
    R lower control limit = LCLR = D3 R
    X upper control limit = UCLX = X + A2 R
    X lower control limit = LCL X = X – A2 R
    相關(guān)PDF資料
    PDF描述
    MPSW10 500 mA, 300 V, NPN, Si, SMALL SIGNAL TRANSISTOR, TO-92
    MPSW10ZL1 500 mA, 300 V, NPN, Si, SMALL SIGNAL TRANSISTOR, TO-92
    MPSW10RLRA 500 mA, 300 V, NPN, Si, SMALL SIGNAL TRANSISTOR, TO-92
    MPSW10RL 500 mA, 300 V, NPN, Si, SMALL SIGNAL TRANSISTOR, TO-92
    MPSW10RLRE 500 mA, 300 V, NPN, Si, SMALL SIGNAL TRANSISTOR, TO-92
    相關(guān)代理商/技術(shù)參數(shù)
    參數(shù)描述
    MPSW13 制造商:ONSEMI 制造商全稱(chēng):ON Semiconductor 功能描述:One Watt Darlington Transistors(NPN Silicon)
    MPSW13RLRA 功能描述:達(dá)林頓晶體管 1A 30V NPN RoHS:否 制造商:Texas Instruments 配置:Octal 晶體管極性:NPN 集電極—發(fā)射極最大電壓 VCEO:50 V 發(fā)射極 - 基極電壓 VEBO: 集電極—基極電壓 VCBO: 最大直流電集電極電流:0.5 A 最大集電極截止電流: 功率耗散: 最大工作溫度:+ 150 C 安裝風(fēng)格:SMD/SMT 封裝 / 箱體:SOIC-18 封裝:Reel
    MPSW13RLRAG 功能描述:達(dá)林頓晶體管 1A 30V NPN RoHS:否 制造商:Texas Instruments 配置:Octal 晶體管極性:NPN 集電極—發(fā)射極最大電壓 VCEO:50 V 發(fā)射極 - 基極電壓 VEBO: 集電極—基極電壓 VCBO: 最大直流電集電極電流:0.5 A 最大集電極截止電流: 功率耗散: 最大工作溫度:+ 150 C 安裝風(fēng)格:SMD/SMT 封裝 / 箱體:SOIC-18 封裝:Reel
    MPSW14 制造商:ONSEMI 制造商全稱(chēng):ON Semiconductor 功能描述:One Watt Darlington Transistors(NPN Silicon)
    MPSW3725 功能描述:兩極晶體管 - BJT NPN Transistor RoHS:否 制造商:STMicroelectronics 配置: 晶體管極性:PNP 集電極—基極電壓 VCBO: 集電極—發(fā)射極最大電壓 VCEO:- 40 V 發(fā)射極 - 基極電壓 VEBO:- 6 V 集電極—射極飽和電壓: 最大直流電集電極電流: 增益帶寬產(chǎn)品fT: 直流集電極/Base Gain hfe Min:100 A 最大工作溫度: 安裝風(fēng)格:SMD/SMT 封裝 / 箱體:PowerFLAT 2 x 2
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